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Home > products > CMOS Cleaning > SM-580 in-line Centrifugal cleaning machine

SM-580 in-line Centrifugal cleaning machine

The equipment adopts high-speed centrifugal design, which is mainly used for precise cleaning of silicon, dust and iron scraps on the surface of lens holder assembly (CMOS body, CCD), and equipped with two-fluid cleaning, electrostatic elimination, high-speed centrifugation and other devices to achieve the purpose of drying and cleaning.

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  • ◆Replaceable wafer placement fixture;

    ◆The integrated cleaning system is adopted for the equipment, which can realize single-sided cleaning and double-sided cleaning;

    ◆The operation procedure can be compiled and adjusted according to the operation requirements, which is convenient, quick and more humanized;

    ◆Rotary spray rod, change position when cleaning and centrifugal dehydration, avoid secondary contamination of products;

    ◆High speed centrifugal design, the revolving speed can be adjusted in the range of 10-1500r / min;

    ◆Equipped with unique electrostatic elimination device, assisted cleaning to achieve the best results;

    ◆Equipped with two-stage air filtration system, complying with ISO8573.1 standard; the compressed air connected to the equipment is cleaner;

    ◆Space saving design: reduce equipment width;

    ◆The whole machine is made of 316 stainless steel body, which is resistant to acid and alkali and has no pollution to the working environment. The mirror shell makes the equipment easy to clean during maintenance;

    ◆Equipped with optical fiber induction detection system to avoid overlapping of incoming materials;

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    Dimension

    Without feeding machine: 1310Lx1220Wx1950H (mm)

    With feeding machine: 1770Lx1220Wx1950H (mm)

    Power Supply

    7KW 13A  380V 50Hz (Three phase five wire)

    Power consumption

    Cleaning: 7KW / h;    Standby: 1kW / h

    Transmission power

    3KW

    Pure water cleanliness

    ≧17MΩ.cm

    Pure water pressure

    ≧0.2MPa

    Compressed air capacity

    ≧8m³/min

    Compressed air pressure

    0.3--0.6MPa

    Equipment material

    Machine body 316 mirror stainless steel

    Control mode

    PLC+ touch screen + own research and development software

    Centrifugal cleaning releases pressure

    0.15--1.4MPa

    Cleaning method

    Water and air two-fluid cleaning

    Drying method

    High speed centrifugal dehydration (ionic wind assisted)

    Pure water filtration accuracy

    1μm

    Air filtration accuracy

    0.01μm

    Diameter of cleanable dust

    ≧1μm   ≧99.5%

    Maximum consumption of pure water

    10L/min

    Gas consumption

    100-300L/Min

    Maximum working panel

    Φ530mm

    Maximum cleaning workpiece

    200(L)*140(W)mm

    Working disk revolving speed

    10--1500r/min

    Fixture specification

    Customization

    Pure water inlet apertures

    PT1″Pipe thread

    Drainage outlet apertures

    PT1″Pipe thread

    Air inlet apertures

    Φ12mmPU air pipe

    Exhaust port apertures

    4″×2(Need to strengthen ventilation, wind speed is greater than 3m/sec)

    Pure water consumption

    0-8L/Min

    Environment filtering method

    0.3μm

    Air filtration mode

    0.01μm×2(Precise)

    Net weight

    About 600KG

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Add: 1 Floor, 13 Building, HongFa Industrial Park, Tangtou Road 91, Shiyan Town, Baoan District, Shenzhen, China

Tel:0755-27620900

Mail:sam888@china-sam.com